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Superior CD and Overlay Measurement for Photo/Etch Department Process Control
Orbotech's CD/Overlay technology enables the performance of Photo/Etch department process control using critical dimension and overlay measurement directly on the AOI. Instead of moving glass panels to a dedicated, resource consuming standalone CD/Overlay machine, manufacturers can perform these measurements using their AOI for each panel, immediately following defect inspection.

The result is cost-effective real-time process monitoring and simplified test and measurement department logistics, resulting in higher yields and reduced bottom-line manufacturing costs.

Highlights:

  • High speed measurement
  • High accuracy and repeatability
  • Inspection and metrology on the same platform
Benefits:
  • Enables higher sampling rate
  • Significantly increases measurements capacity
  • Increases the level of process control
  • High speed measurement
  • Saves offline metrology time
  • Saves purchasing stand-alone metrology equipment
  • Saves clean room space and expenses
  • No need to transfer glasses for metrology

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